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Exploring Polarization Doping in Gan for Power Applications

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개인저자Zhu, Mingda.
단체저자명Cornell University. Electrical & Computer Engrng.
서명/저자사항Exploring Polarization Doping in Gan for Power Applications.
발행사항[S.l.] : Cornell University., 2018
발행사항Ann Arbor : ProQuest Dissertations & Theses, 2018
형태사항167 p.
소장본 주기School code: 0058.
ISBN9780438345317
일반주기 Source: Dissertation Abstracts International, Volume: 80-01(E), Section: B.
Adviser: Huili Grace Xing.
요약GaN has made tremendous progress in photonic and radio frequency applications, largely thanks to its wide band gap (3.4 eV), the high electron mobility (up to 2200 cm2 /V 쨌 s) and saturation velocity (>10 7 cm/s). With the wide band gap and high
요약GaN high electron mobility transistors (HEMTs), which are based on the polarization-induced 2DEG, have already been well researched for power applications. The highest reported breakdown voltage of GaN HEMTs is as high as &sim
요약In contrast to the polarization-induced 2DEG, the polarization-induced 3D bulk doping is rarely studied for power applications. Here we start by studying the electron mobility in polarization-doped AlxGa 1-x N with a low doping concentration of
요약Both polarization-induced 2DEG and bulk doping are then applied to a GaN metal- oxide-semiconductor HEMT (MOSHEMT) with a polarization-doped p-type back barrier. This device, referred to as PolarMOSH is an integral component for the power transi
일반주제명Electrical engineering.
언어영어
기본자료 저록Dissertation Abstracts International80-01B(E).
Dissertation Abstract International
대출바로가기http://www.riss.kr/pdu/ddodLink.do?id=T15000945

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