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020 ▼a 9780438001121
035 ▼a (MiAaPQ)AAI10189653
035 ▼a (MiAaPQ)wisc:13559
040 ▼a MiAaPQ ▼c MiAaPQ ▼d 248032
0820 ▼a 620.11
1001 ▼a Li, Zhaodong.
24510 ▼a Three Dimensional Nanoarchitectures by Atomic Layer Deposition for Energy-Related Applications.
260 ▼a [S.l.] : ▼b The University of Wisconsin - Madison., ▼c 2016
260 1 ▼a Ann Arbor : ▼b ProQuest Dissertations & Theses, ▼c 2016
300 ▼a 170 p.
500 ▼a Source: Dissertation Abstracts International, Volume: 79-10(E), Section: B.
500 ▼a Adviser: Xudong Wang.
5021 ▼a Thesis (Ph.D.)--The University of Wisconsin - Madison, 2016.
520 ▼a Atomic layer deposition (ALD) is a cyclic, multi-step thin film chemical vapor deposition process based on sequential self-limiting surface reactions. It has been widely applied for synthesizing various three dimensional (3D) nanoscale morpholog
520 ▼a In this dissertation, a series of experimental work is presented regarding fundamental understandings and rational controls of the SPCVD process in branched nanorod (NR) synthesis, as well as the application potentials of 3D branched nanowire ar
590 ▼a School code: 0262.
650 4 ▼a Materials science.
650 4 ▼a Chemical engineering.
690 ▼a 0794
690 ▼a 0542
71020 ▼a The University of Wisconsin - Madison. ▼b Materials Engineering.
7730 ▼t Dissertation Abstracts International ▼g 79-10B(E).
773 ▼t Dissertation Abstract International
790 ▼a 0262
791 ▼a Ph.D.
792 ▼a 2016
793 ▼a English
85640 ▼u http://www.riss.kr/pdu/ddodLink.do?id=T14996492 ▼n KERIS
980 ▼a 201812 ▼f 2019
990 ▼a 관리자