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008181129s2018 |||||||||||||||||c||eng d
020 ▼a 9780438089525
035 ▼a (MiAaPQ)AAI10830311
035 ▼a (MiAaPQ)ucla:17102
040 ▼a MiAaPQ ▼c MiAaPQ ▼d 248032
0820 ▼a 660
1001 ▼a Altieri, Nicholas.
24510 ▼a Atomic Layer Etching of Magnetic and Noble Metals.
260 ▼a [S.l.] : ▼b University of California, Los Angeles., ▼c 2018
260 1 ▼a Ann Arbor : ▼b ProQuest Dissertations & Theses, ▼c 2018
300 ▼a 328 p.
500 ▼a Source: Dissertation Abstracts International, Volume: 79-11(E), Section: B.
500 ▼a Adviser: Jane P. Chang.
5021 ▼a Thesis (Ph.D.)--University of California, Los Angeles, 2018.
520 ▼a This work has focused on the study and development of atomic layer etching for metallic and intermetallic thin films commonly used in front and back end of line applications. A thermodynamic equilibrium based framework consisting of minimization
520 ▼a In order to achieve a self-limiting etch process for use in atomic scale patterning, O2 plasma modification in conjunction with the use of organic solution and vapor chemistries was studied as well. In concentrated solutions of acetylacetone, he
590 ▼a School code: 0031.
650 4 ▼a Chemical engineering.
690 ▼a 0542
71020 ▼a University of California, Los Angeles. ▼b Chemical Engineering 0294.
7730 ▼t Dissertation Abstracts International ▼g 79-11B(E).
773 ▼t Dissertation Abstract International
790 ▼a 0031
791 ▼a Ph.D.
792 ▼a 2018
793 ▼a English
85640 ▼u http://www.riss.kr/pdu/ddodLink.do?id=T14999419 ▼n KERIS
980 ▼a 201812 ▼f 2019
990 ▼a 관리자