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008181129s2018 |||||||||||||||||c||eng d
020 ▼a 9780438018501
035 ▼a (MiAaPQ)AAI10808162
035 ▼a (MiAaPQ)purdue:22683
040 ▼a MiAaPQ ▼c MiAaPQ ▼d 248032
0820 ▼a 620.11
1001 ▼a Guzman, David M.
24510 ▼a Structural, Thermodynamic, and Electronic Properties of Mixed Ionic/Electronic Conductor Materials.
260 ▼a [S.l.] : ▼b Purdue University., ▼c 2018
260 1 ▼a Ann Arbor : ▼b ProQuest Dissertations & Theses, ▼c 2018
300 ▼a 223 p.
500 ▼a Source: Dissertation Abstracts International, Volume: 79-10(E), Section: B.
500 ▼a Adviser: Alejandro Strachan.
5021 ▼a Thesis (Ph.D.)--Purdue University, 2018.
520 ▼a Due to the mainstream CMOS technology facing a rapid approach to the fundamental downscaling limit, beyond CMOS technologies are under active investigation and development with the intention of revolutionizing and sustaining a wide range of appl
520 ▼a The Cu/a-SiO2 system is a promising candidate for resistive switching memory applications. The conduction mechanism in the low-resistance state is known to be filamentary, that is, a physical metallic filament bridges between the metallic electr
520 ▼a Since ab initio molecular dynamics are prohibitively expensive to simulate the switching process in Cu/a-SiO 2 electrochemical metallization cells, a multi-scale simulation approach based on electrochemical dynamics with implicit degrees of free
520 ▼a Unlike the Cu/a-SiO2 system which only exhibits filamentary switching, copper-doped germanium-based glassy chalcogenides show filamentary or threshold type of conduction depending on the chemical composition of the glass and copper concentration
520 ▼a Finally, taking advantage of the van der Waals gap as intercalation sites and crystal order in molybdenum disulfide, a novel mixed ionic-electronic conductor material based on copper and silver intercalation of MoS2 is proposed. The theoretical
590 ▼a School code: 0183.
650 4 ▼a Materials science.
650 4 ▼a Condensed matter physics.
650 4 ▼a Computational physics.
690 ▼a 0794
690 ▼a 0611
690 ▼a 0216
71020 ▼a Purdue University. ▼b Materials Engineering.
7730 ▼t Dissertation Abstracts International ▼g 79-10B(E).
773 ▼t Dissertation Abstract International
790 ▼a 0183
791 ▼a Ph.D.
792 ▼a 2018
793 ▼a English
85640 ▼u http://www.riss.kr/pdu/ddodLink.do?id=T14997796 ▼n KERIS
980 ▼a 201812 ▼f 2019
990 ▼a 관리자