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020 ▼a 9780438078048
035 ▼a (MiAaPQ)AAI10829618
035 ▼a (MiAaPQ)ucla:17019
040 ▼a MiAaPQ ▼c MiAaPQ ▼d 248032
0820 ▼a 660
1001 ▼a Crose, Marquis Grant.
24510 ▼a Multiscale Computational Fluid Dynamics Modeling: Parallelization and Application to Design and Control of Plasma-Enhanced Chemical Vapor Deposition of Thin Film Solar Cells.
260 ▼a [S.l.] : ▼b University of California, Los Angeles., ▼c 2018
260 1 ▼a Ann Arbor : ▼b ProQuest Dissertations & Theses, ▼c 2018
300 ▼a 195 p.
500 ▼a Source: Dissertation Abstracts International, Volume: 79-11(E), Section: B.
500 ▼a Adviser: Panagiotis D. Christofides.
5021 ▼a Thesis (Ph.D.)--University of California, Los Angeles, 2018.
520 ▼a Today, plasma-enhanced chemical vapor deposition (PECVD) remains the dominant processing method for the manufacture of silicon thin films due to inexpensive production and low operating temperatures. Nonetheless, thickness non-uniformity continu
520 ▼a Motivated by these considerations, novel reactor modeling and operational control strategies are developed in this dissertation. Specifically, a macroscopic reactor scale model is presented which captures the creation of a radio frequency (RF) p
590 ▼a School code: 0031.
650 4 ▼a Chemical engineering.
650 4 ▼a Computational chemistry.
650 4 ▼a Computational physics.
690 ▼a 0542
690 ▼a 0219
690 ▼a 0216
71020 ▼a University of California, Los Angeles. ▼b Chemical Engineering.
7730 ▼t Dissertation Abstracts International ▼g 79-11B(E).
773 ▼t Dissertation Abstract International
790 ▼a 0031
791 ▼a Ph.D.
792 ▼a 2018
793 ▼a English
85640 ▼u http://www.riss.kr/pdu/ddodLink.do?id=T14999329 ▼n KERIS
980 ▼a 201812 ▼f 2019
990 ▼a 관리자