MARC보기
LDR00000nmm u2200205 4500
001000000329939
00520241017152036
008181129s2018 ||| | | | eng d
020 ▼a 9780438035959
035 ▼a (MiAaPQ)AAI10747924
035 ▼a (MiAaPQ)upenngdas:13122
040 ▼a MiAaPQ ▼c MiAaPQ ▼d 248032
0491 ▼f DP
0820 ▼a 660
1001 ▼a Onn, Tzia Ming.
24510 ▼a Preparation of Active and Stable High-Surface Area Catalysts by Atomic Layer Deposition.
260 ▼a [S.l.] : ▼b University of Pennsylvania., ▼c 2018
260 1 ▼a Ann Arbor : ▼b ProQuest Dissertations & Theses, ▼c 2018
300 ▼a 189 p.
500 ▼a Source: Dissertation Abstracts International, Volume: 79-10(E), Section: B.
500 ▼a Adviser: Raymond J. Gorte.
5021 ▼a Thesis (Ph.D.)--University of Pennsylvania, 2018.
520 ▼a Deactivation of catalytic functional oxides through the loss of surface area is a major concern. The conventional approach to maintain high-surface area of these materials is to incorporate the functional components onto a support which is less
520 ▼a ALD has been used to form uniform oxides in a layer-by-layer manner with excellent compositional control. However, since ALD was developed in the semi-conductor industry to produce relatively thick films on a flat surface, the design criteria ar
520 ▼a The first area involved fabricating thin films of Fe2O 3, CeO2, CeZrO4, and LaFeO3 on porous Al2O3. These high-surface area films were shown to be uniform and they exhibited excellent thermal stability up to 1273 K when used as supports for Pd i
520 ▼a The second area involved stabilizing metal particles by thin films of LaFeO3 and ZrO2 prepared by ALD. Pd supported on LaFeO3 is of interests as it is the classical example of a "smart" catalyst capable of redispersing metal particles following
590 ▼a School code: 0175.
650 4 ▼a Chemical engineering.
690 ▼a 0542
71020 ▼a University of Pennsylvania. ▼b Chemical and Biomolecular Engineering.
7730 ▼t Dissertation Abstracts International ▼g 79-10B(E).
773 ▼t Dissertation Abstract International
790 ▼a 0175
791 ▼a Ph.D.
792 ▼a 2018
793 ▼a English
85640 ▼u http://www.riss.kr/pdu/ddodLink.do?id=T14996956 ▼n KERIS
980 ▼a 201812 ▼f 2019
990 ▼a 관리자 ▼b 관리자